Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography
dc.contributor.author | Misat, Sylvain Irenee | |
dc.contributor.author | Grozdan, Grozev | |
dc.contributor.author | Versluijs, Janko | |
dc.date.accessioned | 2021-10-15T14:54:57Z | |
dc.date.available | 2021-10-15T14:54:57Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9307 | |
dc.source | IIOimport | |
dc.title | Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Versluijs, Janko | |
dc.source.peerreview | no | |
dc.source.conference | 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
dc.source.conferencedate | 19/09/2004 | |
dc.source.conferencelocation | Brussel Belgium | |
imec.availability | Published - imec |
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