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Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography

dc.contributor.authorMisat, Sylvain Irenee
dc.contributor.authorGrozdan, Grozev
dc.contributor.authorVersluijs, Janko
dc.date.accessioned2021-10-15T14:54:57Z
dc.date.available2021-10-15T14:54:57Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9307
dc.sourceIIOimport
dc.titleSurfactinated rinse against pattern collapse and defectivity in 193 nm lithography
dc.typeOral presentation
dc.contributor.imecauthorVersluijs, Janko
dc.source.peerreviewno
dc.source.conference7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec


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