Publication:

Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography

Date

2004
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Author(s)

Misat, Sylvain Irenee
;
Grozev, Grozdan  
;
Versluijs, Janko  

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Abstract

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1812 since deposited on 2021-10-15
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1812 since deposited on 2021-10-15
Acq. date: 2026-02-24

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