Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography

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Authors
Misat, Sylvain Irenee; Grozdan, Grozev; Versluijs, Janko
Conference
7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
Title
Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography
Publication type
Oral presentation
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