Publication:
Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtualsource.department | 81375c71-3fff-42d4-b453-da08e56f09f4 | |
| cris.virtualsource.department | 3c0ef17e-c406-402f-a948-99b6b5d8a8b3 | |
| cris.virtualsource.orcid | 81375c71-3fff-42d4-b453-da08e56f09f4 | |
| cris.virtualsource.orcid | 3c0ef17e-c406-402f-a948-99b6b5d8a8b3 | |
| dc.contributor.author | Misat, Sylvain Irenee | |
| dc.contributor.author | Grozev, Grozdan | |
| dc.contributor.author | Versluijs, Janko | |
| dc.contributor.imecauthor | Versluijs, Janko | |
| dc.date.accessioned | 2021-10-15T14:54:57Z | |
| dc.date.available | 2021-10-15T14:54:57Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9307 | |
| dc.source.conference | 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
| dc.source.conferencedate | 19/09/2004 | |
| dc.source.conferencelocation | Brussel Belgium | |
| dc.title | Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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