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Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning

dc.contributor.authorOkoroanyanwu, Uzo
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorVereecke, Guy
dc.contributor.authorEliat, Astrid
dc.contributor.authorKocsis, Michael
dc.contributor.authorKang, Young-Seog
dc.contributor.authorJonckheere, Rik
dc.contributor.authorConard, Thierry
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-15T15:09:28Z
dc.date.available2021-10-15T15:09:28Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9361
dc.sourceIIOimport
dc.titleExperimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage487
dc.source.endpage503
dc.source.conferenceOptical Microlithography XVII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE, vol. 5377


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