Show simple item record

A study of the influence of typical wet chemical treatments on the germanium wafer surface

dc.contributor.authorOnsia, Bart
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Peter
dc.contributor.authorRaskin, G.
dc.contributor.authorSioncke, Sonja
dc.contributor.authorTeerlinck, I
dc.contributor.authorTheuwis, A.
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-15T15:11:25Z
dc.date.available2021-10-15T15:11:25Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9368
dc.sourceIIOimport
dc.titleA study of the influence of typical wet chemical treatments on the germanium wafer surface
dc.typeOral presentation
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record