dc.contributor.author | Paraschiv, Vasile | |
dc.contributor.author | Claes, Martine | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Boullart, Werner | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Vanhaelemeersch, Serge | |
dc.date.accessioned | 2021-10-15T15:18:45Z | |
dc.date.available | 2021-10-15T15:18:45Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9395 | |
dc.source | IIOimport | |
dc.title | HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Paraschiv, Vasile | |
dc.contributor.imecauthor | Claes, Martine | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
dc.source.peerreview | no | |
dc.source.conference | 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS | |
dc.source.conferencedate | 20/09/2004 | |
dc.source.conferencelocation | Brussels Belgium | |
imec.availability | Published - imec | |