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Mask topography effect in chromeless phase lithography

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorBekaert, Joost
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Broecke, D.
dc.contributor.authorSocha, R.
dc.date.accessioned2021-10-15T15:26:06Z
dc.date.available2021-10-15T15:26:06Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9423
dc.sourceIIOimport
dc.titleMask topography effect in chromeless phase lithography
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage669
dc.source.endpage679
dc.source.conference24th Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate13/09/2004
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol.5567


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