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dc.contributor.authorPollentier, Ivan
dc.contributor.authorCheng, Shaunee
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorLaidler, David
dc.contributor.authorvan Dommelen, Y.
dc.contributor.authorCarpaij, R.
dc.contributor.authorYu, J.
dc.contributor.authorUchida, J.
dc.contributor.authorViswanathan, A.
dc.contributor.authorChin, D.T.
dc.contributor.authorBarry, K.
dc.contributor.authorJakatdar, N.
dc.date.accessioned2021-10-15T15:33:04Z
dc.date.available2021-10-15T15:33:04Z
dc.date.issued2004-02
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9450
dc.sourceIIOimport
dc.titleIn-line litho cluster monitoring and control using integrated scatterometry
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.source.peerreviewno
dc.source.beginpage105
dc.source.endpage115
dc.source.conferenceData Analysis and Modeling for Process Control
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; vol. 5378


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