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Correlation between the growth-per-cycle and the surface OH group concentration in the AIMe3/H2O ALD process

dc.contributor.authorPuurunen, Riikka
dc.date.accessioned2021-10-15T15:39:23Z
dc.date.available2021-10-15T15:39:23Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9474
dc.sourceIIOimport
dc.titleCorrelation between the growth-per-cycle and the surface OH group concentration in the AIMe3/H2O ALD process
dc.typeMeeting abstract
dc.source.peerreviewno
dc.source.conferenceAtomic Layer Deposition Conference
dc.source.conferencedate16/08/2004
dc.source.conferencelocationHelsinki Finland
imec.availabilityPublished - imec


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