A new breakdown failure mechanism in HfO2 gate dielectrics

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Authors
Ranjan, R.; Pey, K.L.; Tang, L.J.; Tung, C.H.; Groeseneken, Guido; Radhakrishnan, M.K.; Kaczer, Ben; Degraeve, Robin; De Gendt, Stefan
Conference
Proceedings IEEE International Reliability Physics Symposium - IRPS
Title
A new breakdown failure mechanism in HfO2 gate dielectrics
Publication type
Proceedings paper
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