An XPS study of the effects of semiconductor processing treatments used to make InP optoelectronic devices
dc.contributor.author | Van Meirhaeghe, R. L. | |
dc.contributor.author | Goubert, L. | |
dc.contributor.author | Fiermans, L. | |
dc.contributor.author | Laflère, W. H. | |
dc.contributor.author | Cardon, F. | |
dc.contributor.author | De Dobbelaere, Peter | |
dc.contributor.author | Van Daele, P. | |
dc.date.accessioned | 2021-09-29T13:20:13Z | |
dc.date.available | 2021-09-29T13:20:13Z | |
dc.date.issued | 1995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/951 | |
dc.source | IIOimport | |
dc.title | An XPS study of the effects of semiconductor processing treatments used to make InP optoelectronic devices | |
dc.type | Proceedings paper | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 641 | |
dc.source.endpage | 644 | |
dc.source.conference | Microscopy of Semiconducting Materials 1995 | |
dc.source.conferencedate | 20/03/1995 | |
dc.source.conferencelocation | Oxford UK | |
imec.availability | Published - open access | |
imec.internalnotes | IOP Conference Series; Vol. 146 |