Show simple item record

An XPS study of the effects of semiconductor processing treatments used to make InP optoelectronic devices

dc.contributor.authorVan Meirhaeghe, R. L.
dc.contributor.authorGoubert, L.
dc.contributor.authorFiermans, L.
dc.contributor.authorLaflère, W. H.
dc.contributor.authorCardon, F.
dc.contributor.authorDe Dobbelaere, Peter
dc.contributor.authorVan Daele, P.
dc.date.accessioned2021-09-29T13:20:13Z
dc.date.available2021-09-29T13:20:13Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/951
dc.sourceIIOimport
dc.titleAn XPS study of the effects of semiconductor processing treatments used to make InP optoelectronic devices
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage641
dc.source.endpage644
dc.source.conferenceMicroscopy of Semiconducting Materials 1995
dc.source.conferencedate20/03/1995
dc.source.conferencelocationOxford UK
imec.availabilityPublished - open access
imec.internalnotesIOP Conference Series; Vol. 146


Files in this item

Thumbnail
Name:
929.pdf
Size:
111.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record