Show simple item record

Study of pulsed RF DPN process parameters for 65 nm node MOSFET gate dielectrics

dc.contributor.authorRothschild, Aude
dc.contributor.authorKraus, P.A.
dc.contributor.authorChua, T.C.
dc.contributor.authorNouri, F.
dc.contributor.authorCubaynes, Florence
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMertens, Sofie
dc.contributor.authorDate, Lucien
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorSchaekers, Marc
dc.date.accessioned2021-10-15T15:55:10Z
dc.date.available2021-10-15T15:55:10Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9529
dc.sourceIIOimport
dc.titleStudy of pulsed RF DPN process parameters for 65 nm node MOSFET gate dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorDate, Lucien
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.beginpage49
dc.source.endpage53
dc.source.conferenceIntegration of Advanced Micro- and Nanoelectronic Devices - Critical Issues and Solutions
dc.source.conferencedate10/04/2004
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 811


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record