Study of pulsed RF DPN process parameters for 65 nm node MOSFET gate dielectrics

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Authors
Rothschild, Aude; Kraus, P.A.; Chua, T.C.; Nouri, F.; Cubaynes, Florence; Veloso, Anabela; Mertens, Sofie; Date, Lucien; Schreutelkamp, Rob; Schaekers, Marc
Conference
Integration of Advanced Micro- and Nanoelectronic Devices - Critical Issues and Solutions
Title
Study of pulsed RF DPN process parameters for 65 nm node MOSFET gate dielectrics
Publication type
Proceedings paper
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