Publication:

Atomic layer deposited barriers for copper interconnects

Date

2004

Meeting abstract

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Author(s)

Schuhmacher, Jorg

;

Martin Hoyas, Ana

;

;

;

Travaly, Youssef

;

Bruynseraede, Christophe

;

Satta, Alessandra

;

Whelan, Caroline

;

Shamiryan, Denis

;

;

Abell, Thomas

;

Sutcliffe, Victor

;

Schaekers, Marc

;

Statistics

2049 since deposited on 2021-10-15

Acq. date: 2026-05-30