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dc.contributor.authorSeveri, Simone
dc.contributor.authorKottantharayil, Anil
dc.contributor.authorPawlak, Bartek
dc.contributor.authorDuffy, Ray
dc.contributor.authorHenson, K.
dc.contributor.authorLindsay, R.
dc.contributor.authorLauwers, Anne
dc.contributor.authorVeloso, Anabela
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorRamos, Javier
dc.contributor.authorSijmus, Bram
dc.contributor.authorDevriendt, Katia
dc.contributor.authorCamillo-Castillo, A.
dc.contributor.authorEyben, Pierre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJurczak, Gosia
dc.contributor.authorBiesemans, Serge
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-15T16:10:23Z
dc.date.available2021-10-15T16:10:23Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9582
dc.sourceIIOimport
dc.titleDiffusion-less junctions and super halo profiles for PMOS transistors formed by SPER and FUSI gate in 45 nm physical gate length devices
dc.typeProceedings paper
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.source.peerreviewno
dc.source.beginpage99
dc.source.endpage102
dc.source.conferenceTechnical Digest International Electron Devices Meeting - IEDM
dc.source.conferencedate13/12/2004
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


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