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Selective wet etching of Hf-based layers

dc.contributor.authorSnow, Jim
dc.contributor.authorClaes, Martine
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorKraus, Harald
dc.contributor.authorEitoku, Atsuro
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T16:19:40Z
dc.date.available2021-10-15T16:19:40Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9614
dc.sourceIIOimport
dc.titleSelective wet etching of Hf-based layers
dc.typeOral presentation
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceSematech Wafer Clean & Surface Prep Conference
dc.source.conferencedate6/05/2004
dc.source.conferencelocationAustin, TX USA
imec.availabilityPublished - imec


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