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Plasma-induced 193-nm resist deformation: problems and a possible solution

dc.contributor.authorStruyf, Herbert
dc.contributor.authorDupont, Tania
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorBoullart, Werner
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-10-15T16:29:59Z
dc.date.available2021-10-15T16:29:59Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9649
dc.sourceIIOimport
dc.titlePlasma-induced 193-nm resist deformation: problems and a possible solution
dc.typeProceedings paper
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDupont, Tania
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conference26th International Symposium on Dry Process
dc.source.conferencedate30/11/2004
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec


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