dc.contributor.author | Torregiani, Cristina | |
dc.contributor.author | Liu, Joy | |
dc.contributor.author | Vandevelde, Bart | |
dc.contributor.author | Degryse, Dominiek | |
dc.contributor.author | Van Dal, Mark | |
dc.contributor.author | Benedetti, Alessandro | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-15T16:42:09Z | |
dc.date.available | 2021-10-15T16:42:09Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9688 | |
dc.source | IIOimport | |
dc.title | A finite element study of process induced stress in the transistor channel: effects of silicide contact and gate stack | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vandevelde, Bart | |
dc.contributor.imecauthor | Van Dal, Mark | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | Vandevelde, Bart::0000-0002-6753-6438 | |
dc.source.peerreview | no | |
dc.source.beginpage | 61 | |
dc.source.endpage | 68 | |
dc.source.conference | EuroSimE: 5th Int. Conf. on Thermal & Mechanical Simulation and Experiments in Micro-Electronics and Micro-Systems | |
dc.source.conferencedate | 9/05/2004 | |
dc.source.conferencelocation | Brussels Belgium | |
imec.availability | Published - imec | |