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A finite element study of process induced stress in the transistor channel: effects of silicide contact and gate stack
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Authors
Torregiani, Cristina
;
Liu, Joy
;
Vandevelde, Bart
;
Degryse, Dominiek
;
Van Dal, Mark
;
Benedetti, Alessandro
;
Lauwers, Anne
;
Maex, Karen
Conference
EuroSimE: 5th Int. Conf. on Thermal & Mechanical Simulation and Experiments in Micro-Electronics and Micro-Systems
Title
A finite element study of process induced stress in the transistor channel: effects of silicide contact and gate stack
Publication type
Proceedings paper
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