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Electron microscopy techniques for the assessment of localised stress distributions in semiconductors

dc.contributor.authorVanhellemont, Jan
dc.contributor.authorJanssens, Koenraad
dc.contributor.authorFrabboni, S.
dc.contributor.authorBalboni, R.
dc.contributor.authorArmigliato, A.
dc.date.accessioned2021-09-29T13:21:54Z
dc.date.available2021-09-29T13:21:54Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/971
dc.sourceIIOimport
dc.titleElectron microscopy techniques for the assessment of localised stress distributions in semiconductors
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage174
dc.source.endpage193
dc.source.conferenceALTECH 95: Analytical Techniques for Semiconductor Materials and Process Characterization II. Proceedings of the Satellite Sympo
dc.source.conferencedate28/09/1995
dc.source.conferencelocationThe Hague The Netherlands
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 95-30


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