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Effect of deposition parameters on the stress gradient of CVD and PECVD poly-SiGe for MEMS applications

dc.contributor.authorVan der Donck, Tom
dc.contributor.authorProost, Joris
dc.contributor.authorRusu, Cristina
dc.contributor.authorBaert, Kris
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorCelis, Jean-Pierre
dc.contributor.authorWitvrouw, Ann
dc.date.accessioned2021-10-15T16:54:35Z
dc.date.available2021-10-15T16:54:35Z
dc.date.issued2004-01
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9728
dc.sourceIIOimport
dc.titleEffect of deposition parameters on the stress gradient of CVD and PECVD poly-SiGe for MEMS applications
dc.typeProceedings paper
dc.contributor.imecauthorVan Hoof, Chris
dc.source.peerreviewno
dc.source.beginpage8
dc.source.endpage18
dc.source.conferenceMicromachining and Microfabrication Process Technology IX
dc.source.conferencedate25/01/2004
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5342


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