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Surface preparation techniques for high-k deposition on Ge substrates

dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorBrijs, Bert
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorOnsia, Bart
dc.contributor.authorPuurunen, Riikka
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorZhao, Chao
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T17:00:17Z
dc.date.available2021-10-15T17:00:17Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9745
dc.sourceIIOimport
dc.titleSurface preparation techniques for high-k deposition on Ge substrates
dc.typeOral presentation
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.conference7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec


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