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Overbake: sub-40-nm gate patterning with ArF lithography and binary masks

dc.contributor.authorVan Steenwinckel, David
dc.contributor.authorKwinten, Hans
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorBeckx, Stephan
dc.date.accessioned2021-10-15T17:17:41Z
dc.date.available2021-10-15T17:17:41Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9802
dc.sourceIIOimport
dc.titleOverbake: sub-40-nm gate patterning with ArF lithography and binary masks
dc.typeProceedings paper
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorBeckx, Stephan
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage215
dc.source.endpage225
dc.source.conferenceAdvances in Resist Technology and Processing XXI
dc.source.conferencelocation
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5376


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