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Characterization of integrated optical CD for process control

dc.contributor.authorYu, J.
dc.contributor.authorUchida, J.
dc.contributor.authorVan Dommelen, Y.
dc.contributor.authorCarpaij, R.
dc.contributor.authorCheng, Shaunee
dc.contributor.authorPollentier, Ivan
dc.contributor.authorViswanathan, A.
dc.contributor.authorLane, L.
dc.contributor.authorBarry, K.
dc.contributor.authorJakatdar, N.
dc.date.accessioned2021-10-15T18:11:49Z
dc.date.available2021-10-15T18:11:49Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9967
dc.sourceIIOimport
dc.titleCharacterization of integrated optical CD for process control
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1059
dc.source.endpage1068
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVIII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 5375


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