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HfO2 and HfSixOyNz high-k layers deposited by MOCVD in mixed gas flows of N2O and O2

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1915 since deposited on 2021-10-15
Acq. date: 2026-03-18

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1915 since deposited on 2021-10-15
Acq. date: 2026-03-18

Citations