HfO2 and HfSixOyNz high-k layers deposited by MOCVD in mixed gas flows of N2O and O2

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Authors
Zhao, Chao; Van Elshocht, Sven; Conard, Thierry; Xu, Zhen; Richard, Olivier; Caymax, Matty; De Gendt, Stefan; Heyns, Marc
Conference
Physics and Technology of High-k Gate Dielectrics II
Title
HfO2 and HfSixOyNz high-k layers deposited by MOCVD in mixed gas flows of N2O and O2
Publication type
Proceedings paper
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