Dual work function metal gate CMOS by means of full silicidation (FUSI)

No Thumbnail [100%x80]
Metadata
Show full item record
Authors
Absil, Philippe; Biesemans, Serge; Kittl, Jorge; Lauwers, Anne
Issue
Q4
Journal
Fabtech Magazine
Title
Dual work function metal gate CMOS by means of full silicidation (FUSI)
Publication type
Journal article
Collections