Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
Mathematical description of atomic layer deposition and its application to the nucleation and growth of HfO2 gate dielectric layers
Statistics
Statistics by Category
Download view's map
PNG
JPEG/JPG
Reports
Most viewed
Most viewed per month
Top city views
File Visits
Export Excel
Export CSV
Item
Views
Mathematical description of atomic layer deposition and its application to the nucleation and growth of HfO2 gate dielectric layers
1373