Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
Anisotropic quasi-atomic layer etching of InGaZnO<sub>4</sub> using unbiased CH<sub>4</sub> and continuous/pulsed biased O<sub>2</sub> plasmas
Statistics
Statistics by Category
Reports
Most viewed
Most viewed per month
Top city views
File Visits
Export Excel
Export CSV
Item
Views
Anisotropic quasi-atomic layer etching of InGaZnO<sub>4</sub> using unbiased CH<sub>4</sub> and continuous/pulsed biased O<sub>2</sub> plasmas
0