Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. On the relation between low-temperature epitaxial growth conditions and the surface morphology of epitaxial Si and Si1-xGex layers, grown in an ultrahigh vacuum, very low pressure chemical vapour deposition reactor
  3. Statistics

Statistics by Category

Reports

  • Most viewed
  • Most viewed per month
  • Top city views
  • File Visits
Item Views
On the relation between low-temperature epitaxial growth conditions and the surface morphology of epitaxial Si and Si1-xGex layers, grown in an ultrahigh vacuum, very low pressure chemical vapour deposition reactor 32501

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings