Browsing by Author "Adams, Jacob"
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Publication EUV resist requirements: absorbance and acid yield
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727332Publication Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.72733G