Browsing by Author "Adriaensens, Peter"

31P solid state NMR for the quantitative characterization of TiO2 nanopowders modified with phosphonic acids

31P-SS-NMR and ATR-IR characterization of TiO2 functionalized with phosphonic acids for solid phase extraction and purification applications

A detailed investigation of the microwave assisted phenylphosphonic acid modification of P25 TiO2

A Miscibility Study of p(MMA-co-HEMA)-Based Polymer Blends by Thermal Analysis and Solid-State NMR Relaxometry

A new method to graft titania using Gragnard reagents

A novel explanation for the increased conductivity in annealed Al-doped ZnO: an insight into migration of aluminium and displacement of zinc

Actuated conformational switching in a single crystal of a homodithiacalix(4)arene

Altering Mechanical Properties to Improve Electrode Contacts by Organic Modification of Silica-Based Ionogel Electrolytes for Sodium-Ion Batteries

An efficient protocol towards site-specifically clickable nanobodies in high yield: cytoplasmic expression in Escherichia coli combined with intein-mediated protein ligation

An efficient thermal elimination pathway toward phosphodiester hydrogels via a precursor approach

An environment friendly wet strip process for 193 nm lithography patterning in BEOL applications

An environment friendly wet strip process for 193 nm lithography patterning in BEOL applications

Analysis of bulk heterojunction organic solar cell blends by solid-state NMR relaxometry and sensitive external quantum efficiency - Impact of polymer side chain variation on nanoscale morphology

Binding modes of phosphonic acid derivatives adsorbed on TiO2 surfaces: Assigments of experimental IR and NMR spectra based on DFT/PBC calculations

Biochar from raw and spent common ivy: Impact of preprocessing and pyrolysis temperature on biochar properties

Cell-Interactive Gelatin-Based 1F MRI Tracers: An In Vitro Proof-of-Concept Study

Characterization of modification of 193-nm photoresist by HBr plasma

Characterization of modification of 193-nm photoresist by HBr plasma

Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes

Charge-discharge characteristics of textile energy storage devices having different PEDOT:PSS ratios and conductive yarns configuration