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Articles
Characterization of modification of 193-nm photoresist by HBr plasma
Publication:
Characterization of modification of 193-nm photoresist by HBr plasma
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vereecke, Guy
;
Claes, Martine
;
Le, Quoc Toan
;
Kesters, Els
;
Struyf, Herbert
;
Carleer, Robert
;
Adriaensens, Peter
Journal
Electrochemical and Solid-State Letters
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1912
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Acq. date: 2026-01-26
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Views
1912
since deposited on 2021-10-19
1
last month
Acq. date: 2026-01-26
Citations