Publication:

Characterization of modification of 193-nm photoresist by HBr plasma

Date

2011
Journal article
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dc.contributor.authorVereecke, Guy
dc.contributor.authorClaes, Martine
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorStruyf, Herbert
dc.contributor.authorCarleer, Robert
dc.contributor.authorAdriaensens, Peter
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorAdriaensens, Peter
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.date.accessioned2021-10-19T21:00:10Z
dc.date.available2021-10-19T21:00:10Z
dc.date.issued2011
dc.identifier.issn1099-0062
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20055
dc.identifier.urlhttp://link.aip.org/link/?ESL/14/H408
dc.source.beginpageH408
dc.source.endpageH410
dc.source.issue10
dc.source.journalElectrochemical and Solid-State Letters
dc.source.volume14
dc.title

Characterization of modification of 193-nm photoresist by HBr plasma

dc.typeJournal article
dspace.entity.typePublication
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