Browsing by Author "Anunciado, Roy"
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Publication Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE
Proceedings paper2022, International Conference on Extreme Ultraviolet Lithography, SEP 26-29, 2022, p.Art. 122920JPublication Efficient hybrid metrology for focus, CD, and overlay
Proceedings paper2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.101452EPublication Feature grouping to enable edge placement error-aware process control in multi-feature logic use case
Proceedings paper2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 129550OPublication Metal Etch Depth Metrology using YieldStar and CDSEM
Proceedings paper2024, 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), MAY 13-16, 2024Publication Pattern selection strategy by clustering for logic EPE monitoring