Browsing by Author "Arai, H"

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Integration of porogen-based low-k films: influence of capping layer thickness and long thermal anneals on low-k damage and reliability

De Roest, David
;
Vereecke, Bart
;
Huffman, Craig
;
Heylen, Nancy
;
Croes, Kristof
;
Arai, H
;
Takamure, N
Meeting abstract
2009, Advanced Metallization Conference, 13/10/2009
Optimization of low-k UV curing: effect of wavelength on critical properties of the dielectric

Aksenov, German
;
De Roest, David
;
Verdonck, Patrick
;
Dultsev, F.N.
;
Marsik, Prema
Proceedings paper
2009, Materials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics, 14/04/2009, p.1156-D02-08