Browsing by Author "Bauer, Markus"
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Publication Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, (18) 1, p.11005Publication Attenuated PSM for EUV: Can they mitigate 3D mask effects?
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.1058312Publication Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Journal article2020, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, (19) 4Publication Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography
Proceedings paper2020, Extreme Ultraviolet (EUV) Lithography XI, 23/02/2020, p.1132309