Publication:

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Date

2020
Journal article
https://doi.org/10.1117/1.JMM.19.4.041001
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Author(s)

Erdmann, Andreas
;
Mesilhy, Hazem
;
Evanschitzky, Peter
;
Philipsen, Vicky  
;
Timmermans, Frank
;
Bauer, Markus

Journal

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS

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1918 since deposited on 2021-11-02
Acq. date: 2025-10-27

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1918 since deposited on 2021-11-02
Acq. date: 2025-10-27

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