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Articles
Perspectives and tradeoffs of absorber materials for high NA EUV lithography
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Perspectives and tradeoffs of absorber materials for high NA EUV lithography
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Date
2020
Journal article
https://doi.org/10.1117/1.JMM.19.4.041001
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Erdmann, Andreas
;
Mesilhy, Hazem
;
Evanschitzky, Peter
;
Philipsen, Vicky
;
Timmermans, Frank
;
Bauer, Markus
Journal
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
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1922
since deposited on 2021-11-02
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Acq. date: 2025-12-11
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Metrics
Views
1922
since deposited on 2021-11-02
1
last month
Acq. date: 2025-12-11
Citations