Publication:

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

Date

2020
Journal article
https://doi.org/10.1117/1.JMM.19.4.041001
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dc.contributor.authorErdmann, Andreas
dc.contributor.authorMesilhy, Hazem
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorTimmermans, Frank
dc.contributor.authorBauer, Markus
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2022-01-20T09:34:57Z
dc.date.available2021-11-02T16:06:41Z
dc.date.available2022-01-20T09:34:57Z
dc.date.issued2020
dc.identifier.doi10.1117/1.JMM.19.4.041001
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38293
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
dc.source.numberofpages16
dc.source.volume19
dc.subject.keywordsAERIAL IMAGE
dc.subject.keywordsMASK
dc.title

Perspectives and tradeoffs of absorber materials for high NA EUV lithography

dc.typeJournal article
dspace.entity.typePublication
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