Browsing by Author "Bebelman, Sabine"
Now showing 1 - 2 of 2
- Results Per Page
- Sort Options
Publication Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes
Oral presentation2007, 1st International Workshop Plasma Etch and Strip in Microelectronics - PESMPublication Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
Journal article2008, Thin Solid Films, (516) 11, p.3454-3459