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Browsing by Author "Bencher, Chris"

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    Characterization of EUV resists for defectivity at 32nm

    Montal, Ofir
    ;
    Dolev, Ido
    ;
    Rosenzweig, Moshe
    ;
    Dotan, Kfir
    ;
    Meshulach, Doron
    ;
    Adan, Ofer
    Proceedings paper
    2011, Metrology, Inspection, and Process Control XXV, 27/02/2011, p.79710G
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    Mandrel-based patterning: density multiplication techniques for15nm nodes

    Bencher, Chris
    ;
    Dai, Huixiong
    ;
    Miao, Liyan
    ;
    Chen, Yongmei
    ;
    Xu, Ping
    ;
    Chen, Yijian
    Proceedings paper
    2011, Optical Microlithography XXIV, 27/02/2011, p.79730K

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