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Browsing by Author "Berry, I."

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    Evaluation of the degree of damage after different conditions of He/H2 dry strip plasma on silica-based porous low-k materials - compatiblity study with chemical solutions

    Kesters, Els  
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    Le, Quoc Toan  
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    Boullart, Werner  
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    Han, Q.
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    Berry, I.
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    Waldfried, C.
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    Mertens, Paul  
    Proceedings paper
    2005, Cleaning Technology in Semiconductor Devices Manufacturing IX, 16/10/2005, p.319-326
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    Modifications of porous low-k by plasma treatments and wet cleans

    Xu, Kaidong
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    Vereecke, Guy  
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    Kesters, Els  
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    Le, Quoc Toan  
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    Lux, Marcel  
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    Henry, Sally-Ann
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    Kraus, Harald
    Proceedings paper
    2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.409-416
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    Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantation

    Mannaert, Geert  
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    Vos, Rita  
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    Tsvetanova, Diana  
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    Altamirano Sanchez, Efrain  
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    Witters, Liesbeth  
    Proceedings paper
    2011, ULSI Process Integration 7, 9/10/2011, p.283-291

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