Browsing by Author "Berry, I."
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Publication Evaluation of the degree of damage after different conditions of He/H2 dry strip plasma on silica-based porous low-k materials - compatiblity study with chemical solutions
Proceedings paper2005, Cleaning Technology in Semiconductor Devices Manufacturing IX, 16/10/2005, p.319-326Publication Modifications of porous low-k by plasma treatments and wet cleans
;Xu, Kaidong; ; ; ; ;Henry, Sally-AnnKraus, HaraldProceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.409-416Publication Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantation
Proceedings paper2011, ULSI Process Integration 7, 9/10/2011, p.283-291