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Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantation
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Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantation
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Date
2011
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mannaert, Geert
;
Vos, Rita
;
Tsvetanova, Diana
;
Altamirano Sanchez, Efrain
;
Witters, Liesbeth
;
Demand, Marc
;
Sonnemans, R.
;
Berry, I.
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1871
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Views
1871
since deposited on 2021-10-19
1
last month
Acq. date: 2025-12-10
Citations