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Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantation

Date

2011
Proceedings Paper
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dc.contributor.authorMannaert, Geert
dc.contributor.authorVos, Rita
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorDemand, Marc
dc.contributor.authorSonnemans, R.
dc.contributor.authorBerry, I.
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorDemand, Marc
dc.date.accessioned2021-10-19T16:00:11Z
dc.date.available2021-10-19T16:00:11Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19377
dc.source.beginpage283
dc.source.conferenceULSI Process Integration 7
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
dc.source.endpage291
dc.title

Optimization of resist ash processes on Si045Ge055 substrates for post extension-halo ion implantation

dc.typeProceedings paper
dspace.entity.typePublication
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