Browsing by Author "Biafore, John J."
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Publication Characterizing and modeling electrical response to light for metal based EUV photoresists
Proceedings paper2016, Advances in Patterning Materials and Processes XXXIII, 21/02/2016, p.977906Publication Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 3, p.33004Publication Investigation of interactions between metrology and lithography with a CD SEM simulator
Proceedings paper2014, Advances in Patterning Materials and Processes XXXI, 23/02/2014, p.905109Publication Modelling the lithography of ion implantation resists on topography
Proceedings paper2014, Optical Microlithography XXVII, 23/02/2014, p.90520ZPublication Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations
Proceedings paper2015, Metrology, Inspection, and Process Control for Microlithography XXIX, 22/02/2015, p.94242APublication XAS photoresists electron/quantum yields study with synchrotron light
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942507