Browsing by Author "Blackwell, James M."
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Publication Critical material properties for pattern collapse mitigation
Proceedings paper2012, Advances in Resist Materials and Processing Technology XXIX, 12/02/2012, p.83250RPublication Critical material properties for pattern collapse mitigation
Journal article2012, Journal of Micro/Nanolithography MEMS and MOEMS, (11) 3, p.33004Publication Photobase generator enabled pitch division: a progress report
Publication Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
Journal article2012, Journal of Vacuum Science and Technology B, (30) 6, p.06FG01