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Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
Publication:
Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
Date
2012
Journal article
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24625.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Winroth, Gustaf
;
Younkin, Todd
;
Blackwell, James M.
;
Gronheid, Roel
Journal
Journal of Vacuum Science and Technology B
Abstract
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1890
since deposited on 2021-10-20
Acq. date: 2025-10-24
Citations
Metrics
Views
1890
since deposited on 2021-10-20
Acq. date: 2025-10-24
Citations