Publication:

Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists

Date

2012
Journal article
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dc.contributor.authorWinroth, Gustaf
dc.contributor.authorYounkin, Todd
dc.contributor.authorBlackwell, James M.
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-20T19:02:16Z
dc.date.available2021-10-20T19:02:16Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21856
dc.source.beginpage06FG01
dc.source.issue6
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.volume30
dc.title

Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists

dc.typeJournal article
dspace.entity.typePublication
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