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Browsing by Author "Blanquart, Timothee"

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    Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films

    Peter, Antony  
    ;
    Sepulveda Marquez, Alfonso  
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    Meersschaut, Johan  
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    Dara, Praveen  
    Journal article
    2022, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, (40) 5, p.Art. 054001
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    Electrical characteristics of P-type bulk Si fin field-effect transistor using solid-source doping with 1-nm phosphosilicate glass

    Kikuchi, Yoshiaki  
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    Chiarella, Thomas  
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    De Roest, David  
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    Blanquart, Timothee  
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    De Keersgieter, An  
    Journal article
    2016, IEEE Electron Device Letters, (37) 9, p.1084-1087
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    Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes

    Tomomi, Takayama
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    Taishi, Ebisudani
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    Eiichiro, Shiba
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    Sepulveda Marquez, Alfonso  
    Journal article
    2021, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, (39) 4
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    Nanometer-deep junctions with high doping concentration for Ge SDEs using solid-source doping and flash lamp annealing

    Tanimura, Hideaki
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    Fuse, Kazuhiko
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    Yamada, Takahiro
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    Aoyama, Takayuki
    ;
    Kato, Shinichi
    Proceedings paper
    2017-06, 17th International Workshop on Junction Technology - IWJT, 1/06/2017, p.15-18

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