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Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
Publication:
Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
Date
2021
Journal article
https://doi.org/10.1116/6.0000821
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tomomi, Takayama
;
Taishi, Ebisudani
;
Eiichiro, Shiba
;
Sepulveda Marquez, Alfonso
;
Blanquart, Timothee
;
Kimura, Yosuke
;
Subramanian, Sujith
;
Baudot, Sylvain
;
Briggs, Basoene
;
Gupta, Anshul
;
Veloso, Anabela
;
Capogreco, Elena
;
Mertens, Hans
;
Meersschaut, Johan
;
Conard, Thierry
;
Dara, Praveen
;
Geypen, Jef
;
Martinez Alanis, Gerardo Tadeo
;
Batuk, Dmitry
;
Demuynck, Steven
;
Morin, Pierre
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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1769
since deposited on 2021-11-02
Acq. date: 2025-10-27
Citations
Metrics
Views
1769
since deposited on 2021-11-02
Acq. date: 2025-10-27
Citations