Publication:

Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes

Date

2021
Journal article
https://doi.org/10.1116/6.0000821
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Author(s)

Tomomi, Takayama
;
Taishi, Ebisudani
;
Eiichiro, Shiba
;
Sepulveda Marquez, Alfonso  
;
Blanquart, Timothee  
;
Kimura, Yosuke  
;
Subramanian, Sujith  
;
Baudot, Sylvain  
;
Briggs, Basoene  
;
Gupta, Anshul  
;
Veloso, Anabela  
;
Capogreco, Elena  
;
Mertens, Hans  
;
Meersschaut, Johan  
;
Conard, Thierry  
;
Dara, Praveen  
;
Geypen, Jef  
;
Martinez Alanis, Gerardo Tadeo  
;
Batuk, Dmitry  
;
Demuynck, Steven  
;
Morin, Pierre  

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

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1779 since deposited on 2021-11-02
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Acq. date: 2026-02-24

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