Publication:

Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes

Date

2021
Journal article
https://doi.org/10.1116/6.0000821
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dc.contributor.authorTomomi, Takayama
dc.contributor.authorTaishi, Ebisudani
dc.contributor.authorEiichiro, Shiba
dc.contributor.authorSepulveda Marquez, Alfonso
dc.contributor.authorBlanquart, Timothee
dc.contributor.authorKimura, Yosuke
dc.contributor.authorSubramanian, Sujith
dc.contributor.authorBaudot, Sylvain
dc.contributor.authorBriggs, Basoene
dc.contributor.authorGupta, Anshul
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCapogreco, Elena
dc.contributor.authorMertens, Hans
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorConard, Thierry
dc.contributor.authorDara, Praveen
dc.contributor.authorGeypen, Jef
dc.contributor.authorMartinez Alanis, Gerardo Tadeo
dc.contributor.authorBatuk, Dmitry
dc.contributor.authorDemuynck, Steven
dc.contributor.imecauthorSepulveda Marquez, Alfonso
dc.contributor.imecauthorBlanquart, Timothee
dc.contributor.imecauthorKimura, Yosuke
dc.contributor.imecauthorSubramanian, Sujith
dc.contributor.imecauthorBaudot, Sylvain
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorGupta, Anshul
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDara, Praveen
dc.contributor.imecauthorGeypen, Jef
dc.contributor.imecauthorMartinez Alanis, Gerardo Tadeo
dc.contributor.imecauthorBatuk, Dmitry
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorMorin, Pierre
dc.contributor.orcidimecDara, Praveen::0000-0002-2334-3976
dc.contributor.orcidimecSubramanian, Sujith::0000-0001-8938-9750
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBatuk, Dmitry::0000-0002-6384-6690
dc.contributor.orcidimecMorin, Pierre::0000-0002-4637-496X
dc.contributor.orcidimecKimura, Yosuke::0000-0002-9098-0414
dc.contributor.orcidimecSepulveda Marquez, Alfonso::0000-0003-4726-177X
dc.contributor.orcidimecMartinez Alanis, Gerardo Tadeo::0000-0001-5036-0491
dc.date.accessioned2022-05-10T09:50:32Z
dc.date.available2021-11-02T16:02:03Z
dc.date.available2022-05-10T09:38:12Z
dc.date.available2022-05-10T09:50:32Z
dc.date.issued2021
dc.identifier.doi10.1116/6.0000821
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37961
dc.publisherA V S AMER INST PHYSICS
dc.source.issue4
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
dc.source.numberofpages14
dc.source.volume39
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.subject.keywordsAMORPHOUS-SILICON NITRIDE
dc.subject.keywordsTHIN-FILMS
dc.subject.keywordsOXIDATION RESISTANCE
dc.subject.keywordsPLASMA
dc.subject.keywordsTEMPERATURE
dc.subject.keywordsCHALLENGES
dc.subject.keywordsMICROSTRUCTURE
dc.subject.keywordsDIOXIDE
dc.subject.keywordsDENSITY
dc.title

Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes

dc.typeJournal article
dspace.entity.typePublication
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